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Pre-treatment methods for trace element analysis on the wafer surface.

ICP-MS: Inductively Coupled Plasma Mass Spectrometry

In the process of confirming metal contamination adhered to the wafer surface after the formation of the SiO2 film, a method has traditionally been used where the SiO2 film is dissolved in acid as a pre-treatment for analysis, followed by the analysis of the solution. This method results in analysis that combines metal contamination on the very surface with that within the SiO2 film, making it unsuitable for analyzing only the metal contamination on the very surface. In MST, it is possible to evaluate the metal contamination elements on the wafer's very surface by dissolving only the metal elements adhered to the very surface without dissolving the SiO2 film during the pre-treatment.

企業：一般財団法人材料科学技術振興財団　MST
価格：Other

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Technical Information Magazine 202201-02 fsLA-ICP-MS

Femtosecond laser ablation-inductively coupled plasma mass spectrometry is a useful method for analyzing the two-dimensional distribution of elements present in trace amounts in biological tissues.

The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control. [Abstract] fsLA-ICP-MS (femtosecond laser ablation-inductively coupled plasma mass spectrometry) is a method capable of rapidly and sensitively analyzing inorganic elements in solid samples at a local level, and it has garnered attention as a useful technique for two-dimensional distribution analysis of elements present in trace amounts within biological tissues. This paper introduces the characteristics of fsLA-ICP-MS, examples of drug distribution evaluation in tissues, and quantitative imaging examples using custom-prepared standards. [Table of Contents] 1. Introduction 2. Overview and Characteristics of fsLA-ICP-MS 3. Evaluation of Boron Drug Distribution for BNCT 4. Quantitative Imaging of Iron and Zinc in Mouse Spinal Cord 5. Conclusion

企業：東レリサーチセンター
価格：Less than 10,000 yen

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Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

This is a method for inorganic element analysis using inductively coupled plasma (ICP) as the excitation source.

ICP-MS allows for relatively easy preparation of standard samples that are difficult to produce for solid analysis, as it analyzes solutions. Therefore, it is frequently used for accurately quantifying trace inorganic elements in solutions. - It can detect the lowest concentrations (ppt or sub-ppt levels) due to its high sensitivity and low background, making it the most effective instrument for inorganic element analysis. (*: ppt: 10^-12 g/g) - It allows for flexible preparation of standard samples (standard solutions) that serve as a reference for quantitative analysis, resulting in lower uncertainty in the results. - It enables qualitative analysis by measuring many elements of the periodic table simultaneously. Additionally, it has a wide dynamic range, allowing for simultaneous analysis of major and trace components.

企業：一般財団法人材料科学技術振興財団　MST
価格：Other

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[Analysis Case] Metal Contamination Analysis of Si Wafer Surface (B0233)

It is possible to obtain a large amount of metal element information at once through qualitative and semi-quantitative analysis!

We offer metal contamination analysis of Si wafers (B0233). The purpose of metal contamination analysis of Si wafer surfaces using ICP-MS includes not only the contamination assessment of the Si wafer itself but also the evaluation of contamination within semiconductor devices and the assessment of the working environment due to Si wafer exposure. Therefore, the analysis of Si wafer surfaces is conducted for various purposes. ICP-MS analysis allows for the highly sensitive measurement of metal contamination on Si wafer surfaces, and it is also possible to specify the evaluation area according to the purpose. [Measurement Method] ■ [ICP-MS] Inductively Coupled Plasma Mass Spectrometry *For more details, please download the PDF or feel free to contact us.

企業：一般財団法人材料科学技術振興財団　MST
価格：Other

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Plasma Mass Spectrometer - メーカー・企業と製品の一覧

Plasma Mass Spectrometerの製品一覧

Pre-treatment methods for trace element analysis on the wafer surface.

Technical Information Magazine 202201-02 fsLA-ICP-MS

Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

[Analysis Case] Metal Contamination Analysis of Si Wafer Surface (B0233)

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